Tahiti

The Tahiti System is engineered for large-area manufacturing operations and balances the complex needs of high-volume performance and precise films in an economical package. This advanced ALD system ensures repeatable, exceptionally uniform, pinhole-free thin films on large Gen 4.5 substrates. Easy network integration into automation-driven facilities, low cycle times, and a low cost of ownership make Tahiti the choice of manufacturers worldwide.

Key features include:

• Patented chamber architecture accommodates two stackable ALD process chambers for independently processing two Gen 4.5 substrates (up to 730 x 920 mm) at a time for optimized throughput
• Automation-ready features include ALD-specific pneumatic gate valve, high reliability lift pin mechanism, built-in sensors, and on-board diagnostics
• Easily scales to Gen 5 substrates and beyond
• Precise software control of process parameters including temperature, flow, and pressure delivers accurate, defect-free coatings through our ultra-high precision precursor system
• 4000 hours Mean Time Between Failures (MTBF) for maximum uptime
• Patented ALD Shield™ vapor trap prevents build-up of deposits and prohibits excess gases from being exhausted to the environment
• Low cost of ownership with reduced startup, operational, and maintenance costs including off-the-shelf replacement parts and lowest consumption of precursors
• Standard recipes and ALD materials are readily available
• Comprehensive support and services worldwide from our ALD expert team
• The Tahiti System is built for safety and features industrial hardware and software interlocks