Scientific Abstracts

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Showing customer papers 1-10 of 3917    Next
 
  "Subject index"
  Surface Science, 1995, 341, 338-344
 
Abstract:

 
  "KLA-Tencor Corp has moves into metal metrology"
  III-Vs Review, 2003, 16, 34-34
 
Abstract: KLA-Tencor Corp has moved into Rudolph Technologies\' domain with an inline metal film metrology tool. Still in beta testing, the Metrix 100 uses an electron beam, x-ray detectors and software algorithms to measure both film thickness and film composition. This is a short news story only. Visit www.three-fives.com for the latest advanced semiconductor industry news.

 
  "Atomic Layer Deposition research"
  III-Vs Review, 2003, 16, 26-26
 
Abstract: ASM International NV is to enter into a long-term co-operative agreement with the University of Helsinki to jointly pursue further development of Atomic Layer Deposition (ALD) technology. As part of this agreement, ASM intends to relocate its Espoo, Finland, research and development activities to the nearby campus of the University of Helsinki, Finland. This is a short news story only. Visit www.three-fives.com for the latest advanced semiconductor industry news.

 
  "ASMI buys complimentary Genitech"
  III-Vs Review, 2004, 17, 8-8
 
Abstract:

 
  "Veeco and the current perpendicular plane"
  III-Vs Review, 2004, 17, 27-27
 
Abstract:

 
  "Nano layer deposition patents"
  III-Vs Review, 2004, 17, 25-25
 
Abstract:

 
  "Atomic-layer deposition maps out its place in the nanoscale world"
  Micro, 2004, 22, 16-
 
Abstract:

 
  "Growth of ultrathin metal films"
  Ultrathin Metal Films: Magnetic and Structural Properties, 2004, 206, 5-44
 
Abstract: Driven by the requirement to tailor film properties for many technological applications, our understanding of the atomic processes involved in thin-film growth and the principles governing those processes has progressed tremendously in the last century. Growth of thin films has changed from an art to a science. For ultrathin metal films, the growth conditions are found to have important and sometimes crucial consequences for the structural and magnetic properties of the film. Therefore, manipulating the film growth by detailed control of the growth conditions is an effective pathway to exploring the ultimate potential of ultrathin magnetic films. In this chapter, the various growth modes are first introduced and described from the viewpoints of thermodynamics and kinetics. The growth parameters, such as growth temperature, growth rate and application of a surfactant, are discussed at some length as possible tools to modify the growth and thus the film properties. Experimental techniques for the analysis of the growth mode are described, with an emphasis on reflection high-energy electron diffraction (RHEED).

 
  "Author Index"
  Microelectronic Engineering, 2005, 82, 695-712
 
Abstract:

 
  "Table of Contents"
  Microelectronic Engineering, 2005, 82, v-x
 
Abstract:

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