TRANSPARENT CONDUCTORS
Transparent conducting oxides (TCO) can now be deposited using ALD, taking advantage of all its deposition
advantages.
Examples of TCOs that can be deposited with ALD are doped ZnO, SnO
2, In
2O
3, and Indium Tin Oxide (ITO). These ALD films are much smoother
than their sputtered versions, and show low resistivity and high optical transparency, see for example
doped ZnO nanolaminates
and
Zr doped In2O3.
The thickness uniformity, adhesion and smoothness
of the ALD films is superior over the sputtered films, improving the performance when used as
gate electrodes
for thin film transistors or as electrodes for
OLED displays. Batch processing using ALD allows cheaper manufacture
of large area substrates and
roll to roll coating. Inquire with us about
the various materials for transparant conducting electrodes.
